A Surface Reaction Kinetic Model of a-Si:H Growth During rf-PECVD

Florida: American Bindery, 1994. First. Folio; VG+/no-DJ; spine dark blue w/ gold text good condition; boards strong, clean, tiny factory sticker on inside back cover otherwise very good; very light aging of pages, signatures of by author and thesis committee in beginning pages, otherwise very good. 250pp. Oversize: may require additional postage for expedited/international orders; College thesis.


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